Teng Feng, Lou Zhidong, Xu Zheng, Hou Yanbing. THE DEPENDENCE OF FIELD ON APPLIED VOLTAGE IN TFEL DEVICE[J]. Chinese Journal of Luminescence, 1996,17(4): 337-340
Teng Feng, Lou Zhidong, Xu Zheng, Hou Yanbing. THE DEPENDENCE OF FIELD ON APPLIED VOLTAGE IN TFEL DEVICE[J]. Chinese Journal of Luminescence, 1996,17(4): 337-340DOI:
The field in the phosphor of a TFEL device vs. applied voltage characteristic is investigated by Franz-Keldysh effect. The field strength in the phosphor calculated using this method has difference in numerical value compared with that estimated by the methods of every layer only acting as insulating layer though they are in the same order. The difference is even bigger at the threshold voltage.