Qiu Sichou, Dai Jin, Wu Zhenghua, Huang Hanyao. THE STUDY OF DC SPUTTERED-DEPOSITED ELECTROCHROMIC NiO<sub><i>x</i></sub>H<sub><i>y</i></sub> THIN FILM[J]. Chinese Journal of Luminescence, 1996,17(1): 58-63
Qiu Sichou, Dai Jin, Wu Zhenghua, Huang Hanyao. THE STUDY OF DC SPUTTERED-DEPOSITED ELECTROCHROMIC NiO<sub><i>x</i></sub>H<sub><i>y</i></sub> THIN FILM[J]. Chinese Journal of Luminescence, 1996,17(1): 58-63DOI:
Thin films of nickel oxide were prepared by DC sputtering of nickel hydrooxide powder-pressed target in Ar(or Ar+O
2
) gas. The process is presented in this paper.SEM and XPS were employed to investigate the microstructure of the film and identify its chemical composition. The electrochemical and optical properties of the films were determined by the cyclic voltammetry
spectral transmittance. Our results indicate that the a-NiO
x
H
y
thin films have good electrochromic characteristics.