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中国科学院长春物理研究所, 长春 130021
收稿日期:1991-04-02,
纸质出版日期:1992-05-30
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周天明, 张宝林, 蒋红, 宁永强, 刘迺康, 金亿鑫, 元金山, 缪国庆, 葛中久. Ga<sub>x</sub>In<sub>1-x</sub>As<sub>1-y</sub>Sb<sub>y</sub>合金的MOCVD生长[J]. 发光学报, 1992,13(2): 145-153
Zhou Tianming, Zhang Baolin, Jiang Hong, Ning Yongqiang, Liu Naikang, Jin Yixin, Yuan Jinshan, Miao Guoqing, Ge Zhongjiu. GROWTH OF Ga<sub>x</sub>In<sub>1-x</sub>As<sub>1-y</sub>Sb<sub>y</sub> ALLOYSBY MOCVD AND CHARACTERIZATION[J]. Chinese Journal of Luminescence, 1992,13(2): 145-153
周天明, 张宝林, 蒋红, 宁永强, 刘迺康, 金亿鑫, 元金山, 缪国庆, 葛中久. Ga<sub>x</sub>In<sub>1-x</sub>As<sub>1-y</sub>Sb<sub>y</sub>合金的MOCVD生长[J]. 发光学报, 1992,13(2): 145-153 DOI:
Zhou Tianming, Zhang Baolin, Jiang Hong, Ning Yongqiang, Liu Naikang, Jin Yixin, Yuan Jinshan, Miao Guoqing, Ge Zhongjiu. GROWTH OF Ga<sub>x</sub>In<sub>1-x</sub>As<sub>1-y</sub>Sb<sub>y</sub> ALLOYSBY MOCVD AND CHARACTERIZATION[J]. Chinese Journal of Luminescence, 1992,13(2): 145-153 DOI:
用水平常压MOCVD系统生长了2—4μm波段的Ga
x
In
1-x
As
1-y
Sb
y
合金.气相源包括三甲基镓、三甲基铟
三甲基锑(TMGa、TMIn、TMSb)及砷烷(AsH
3
).研究了富GaSb的Ga
x
In
1-x
As
1-y
Sb
y
的生长特性.发现Ⅴ族源输入绝对量影响Ⅴ族元素的分布系数及Ⅲ族源的利用效率.这表明表面反应动力学对生长有一定影响.固相组分由微电子探针测量.用光致发光、红外吸收技术对合金进行了表征.光致发光光谱半高宽
在2.13μm处仅为30meV.用光致发光
红外吸收测量的结果导出四元合金的带隙G
g
∞
并由组分x
y计算了带隙
实验和计算的结果符合得很好.PL谱半高宽较宽和红外吸收谱的吸收边较缓是可能在固相中存在组分群造成的.
Ga
x
In
1+x
As
1-y
sb
y
alloys in GaSb-rich conner have been grown on the GaSb and GaAs substrates by Metalorganic Chemical Vapor Deposition (MOCVD) in a horizontal
atmospheric pressure reactor. The reac-tants included trimethylgallium (TMGa)
trimethylindium (TMIn)
arsine (AsH
3
) and phosphine (PH
3
). The composition of epi-layer was determined by electron microprobe. It was observed that the composition y of solid depended on the ratio of P
TMsb
to (P
TMsb
+ P
ASH3
) in vapor phase
but also on the AsH
3
flow rate of vapor source
and the growth rate for per molar Ⅲ group source increased with growth temperature below 620℃. It indicated that the growth is influenced by surface kinetics.
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