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中国科学院长春物理研究所
收稿日期:1988-02-27,
纸质出版日期:1989-02-28
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黄锡珉. 在ZnS<sub>x</sub>Se<sub>1-x</sub>单晶中本征缺陷的研究[J]. 发光学报, 1989,10(1): 11-16
Huang Ximin. STUDY OF NATIVE DEFECTS IN ZnS<sub>x</sub>Se<sub>1-x</sub> SINGLE CRYSTALS[J]. Chinese Journal of Luminescence, 1989,10(1): 11-16
本文用气相法生长ZnS
x
Se
1-x
(x=0.03)单晶
解理得到(110)面晶片。在组分分压(Zn或S/Se或Se)下300-800℃范围内进行热处理
在4.2K激子发射光谱中观察到与V
Zn
(Zn空位)有关的I
1
deep
谱线强度的变化。当热处理温度低于300℃时
未观察到I
1
deep谱线强度的变化。在300℃以上热处理样品中均观察到I
1
deep谱线强度的变化。由此研究了V
Zn
浓度随热处理条件的变化。提供了分别控制本征V
Zn
缺陷和掺杂的实验依据。
In general
a single crystal of ZnS
x
Se
1-x
contains native defects which arise from the deviation of stoichiometry in the growth process. These defects have an effect on the electrical and optical properties of single crystals.The purpose of the present investigation is to measure the change of the concentration of Zn vacancy(V
Zn
)in the heat-treated ZnS
x
Se
1-x
wafers using the intensity of I
1
deep
line in the exciton emission spectra.Because I1deep line is known to arise from acceptor of V
Zn
[4]
. For this purpose a wafer specimen was fabricated by cleaving along the (110) plane of the grown ZnS
x
Se
1-x
(x=0.03) single crystal. The wafers were heat-treated in the temperature range of 300-800℃ for 72 hrs.Under the composition (Zn or S/Se or Se) partial pressure and measured by photoluminescence at 4.2 K to observe the bound exciton emission spectra. The exciton emission spectra of the heat-treated ZnS
x
Se
1-x
in Zn pressure and in S/Se pressure at 300℃
500℃
800℃ have been shown in Fig
1-3 (a) and (b)
respectively. The intensity of I
1
deep
line becomes weaker with the increasing temperature of heat-treatment in Zn partial pressure. On the contrary
the intensity of I
1
deep
line becomes stronger in S/Se partial pressure. This result means that the equilibrium between the vapor and the ZnS
x
Se
1-x
. solid during the heat-treatment is controlled by the Se partial pressure and the Zn partial pressure
respectively. Considering the following reaction.Se
2
(g)=Se
Se
+V
Zn
(4)Zn(g)+V
Zn
=Zn
Zn
(5)where Sese and Zn
Zn
are a Se atom and Zn atom occupying a normal Se and Zn site
respectively. Then the concentration of V
Zn
increases with the increasing Se pressure
and decreases with the increasing Zn pressure.Dependence of the intensity ratio on the heat treatment temperature is shown in Fig. 4. It is known from the Fig. 4 that the concentration of V
Zn
is not changed below 300℃
but a change of concentration of V
Zn
is observed above 300℃. Considering that VZn and Cu-doping in ZnSe can separately be controlled
[4]
. Effective control of native defects and doped impurities in compound semiconductors was proposed in this report.
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