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中国科学院长春物理研究所
收稿日期:1986-04-15,
纸质出版日期:1986-11-30
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公猛男, 谢江峰, 孙亚莉, 富淑清, 张传平. 外延生长条件对GaN形貌影响的研究[J]. 发光学报, 1986,7(4): 367-376
Gong Mengnan, Xie Jiangfeng, Sun Yali, Fu Shuqing, Zhang Chuanping. EFFECT OF EPITAXIAL GROWTH CONDITIONS ON MORPHOLOGY OF GaN CRYSTALS[J]. Chinese Journal of Luminescence, 1986,7(4): 367-376
在Ga-HCl-NH
3
-Ar系统中
做了多种生长参量变化对GaN晶体形貌影响的规律实验。结果表明
在其它生长条件固定的情况下
HCl的流量在15.8~21ml/min的范围内时
GaN晶体表面的生长坑大小与深度随HCl流量的增加而增大
反之则减小。而当HCl流量小于15.8ml/min时
生长的GaN膜逐渐成为多坑与多晶状。当大于21ml/min时
GaN膜的表面则逐渐出现丘锥体及多晶。经霍耳测量
样片的电子迁移率平均在116cm
2
/V·s左右
最高的可达462cm
2
/V·s。在HCl流量15.8~21ml/min的范围内
能重复生长出理想的n-GaN。
Epitaxial growth of GaN has been investigated by a large number of people. However
few publications relate to the pattern of the formation of pits and hills on the surface of GaN epitaxial layers during the growth process. Some authors have given an explanation based on the growth mechanism of GaAsP. They believe that the formation of pits or hills on the surface of GaN epitaxial layers probably depends on the amount of GaCl in the growing zone. If GaCl in the growing zone is not enough
pits will occur. On the contrary
hills will be caused. We have investigated the effect of conversion rate of HC1 and Ga on the morphology of GaN. Our experimental results are contradictory to the reference as mentioned above. A tentative explanation is given in this paper.
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