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1. 中国科学院半导体研究所
2. 马普固体研究所 西德
收稿日期:1986-10-06,
纸质出版日期:1987-08-30
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龚秀英, K. S. Löchner, P. Zwicknagl, E. Bauser. InP衬底上GaInAsSb的液相外延生长及其性质的研究[J]. 发光学报, 1987,8(3): 206-215
Gong Xiuying, K. S. L&#246;chner, P. Zwicknagl, E. Bauser. LPE GROWTH AND PROPERTIES OF Ga<sub>x</sub>In<sub>1-x</sub>As<sub>1-y</sub>Sb<sub>y</sub> ON InP[J]. Chinese Journal of Luminescence, 1987,8(3): 206-215
龚秀英, K. S. L&#246;chner, P. Zwicknagl, E. Bauser. InP衬底上GaInAsSb的液相外延生长及其性质的研究[J]. 发光学报, 1987,8(3): 206-215 DOI:
Gong Xiuying, K. S. L&#246;chner, P. Zwicknagl, E. Bauser. LPE GROWTH AND PROPERTIES OF Ga<sub>x</sub>In<sub>1-x</sub>As<sub>1-y</sub>Sb<sub>y</sub> ON InP[J]. Chinese Journal of Luminescence, 1987,8(3): 206-215 DOI:
用内插法和电负性差法估算了GaInAsSb的晶格常数
并用液相外延法在665℃—625℃的温度范围内第一次成功地生长了品格匹配于(100)和(111)B取向的InP衬底的GaInAsSb外延层。测得固体组分的范围为0.46
<
x
<
0.51
0.02
<
y
<
0.045。主荧光峰为1.34—1.63μm。在n~(10
15
—10
18
cm
-3
的范围内
对于(100)GaInAsSb
μ
300k
=8410cm
2
/V·s—12
200cm
2
/V·s。
An empirical estimation for the composition of GalnAsSb with the lattice matched to InP is introduced
which is based on the electronegativity difference of the constituent elements and the lattice constants of binary compounds. The results are in aggrement with those obtained by the following equation: a(Å)=6.0584-0.4165x+0.4204y+0.0317xy. Layers of GalnAsSb
for the first time
are achieved both on (100) and (111) B InP by LPE. The dependence of the surface morphology and hetero-interface quality on growth conditions is investigated. The solid compositions are varied from 0.46 to 0.51 for
x
and 0.02 to 0.045 for y
which is over the miscibility gap for the GalnAsSb reported respectively by K. Nakajima et al. The wavelength of the main luminescence peak can be shifted from 1340nm to 1630nm (Fig.4).In Fig.5
are shown the X-ray diffraction peaks of typical GaInAsSb/InP heterostructure. The FWHM for the epilayer is 12s
indicating the high layer quality.The electrical properties are taken from Van der Pauw measurements. Carrier concentration in the range of 10
15
cm
-3
and room temperature electron mobility up to 12210cm
2
/V·s
which are the highest data so far for the Ⅲ-Ⅴ quaternary alloys
have been achieved.
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