Design of High Illumination Uniformity Inverted LED Plant Light Source System

JIANG Xin-yu; WEN Shang-sheng; MA Bing-xu; LU Yun-le; CAI Ming-xing

doi:10.3788/fgxb20194009.1172

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Design of High Illumination Uniformity Inverted LED Plant Light Source System

Luminescence Applications and Interdisciplinary Fields | 更新时间：2020-08-12

- Design of High Illumination Uniformity Inverted LED Plant Light Source System
- Chinese Journal of Luminescence Vol. 40, Issue 9, Pages: 1172-1184(2019)
- 作者机构：
  
  1. 华南理工大学材料科学与工程学院, 广东广州 510640
  2. 华南理工大学发光材料与器件国家重点实验室, 广东广州 510640
- 作者简介：
- 基金信息：
  
  Supported by Science and Technology Plan Programs of Guangdong Province(2017B010114001,201704030140,2015B010127004);Special Application of Science and Technology Research and Development in Guangdong Province(2015B010134001);Science and Technology Plan Project of Guangzhou City(201604040004,201604016010);Guangdong Yangfan Plans to Introduce Special Team of Innovation and Entrepreneurship(2015YT02C093);Science and Technology Plan Programs of Zhongshan(2016A1009,2017C1011)
- DOI：10.3788/fgxb20194009.1172
  CLC： O432;O439
- Received：23 April 2019，
  
  Revised：02 June 2019，
  
  Published Online：04 June 2019，
  
  Published：05 September 2019
- 稿件说明：
移动端阅览
姜昕宇, 文尚胜, 马丙戌等. 高照明均匀度倒置型LED植物光源系统的设计[J]. 发光学报, 2019,40(9): 1172-1184

JIANG Xin-yu, WEN Shang-sheng, MA Bing-xu etc. Design of High Illumination Uniformity Inverted LED Plant Light Source System[J]. Chinese Journal of Luminescence, 2019,40(9): 1172-1184
姜昕宇, 文尚胜, 马丙戌等. 高照明均匀度倒置型LED植物光源系统的设计[J]. 发光学报, 2019,40(9): 1172-1184 DOI： 10.3788/fgxb20194009.1172.

JIANG Xin-yu, WEN Shang-sheng, MA Bing-xu etc. Design of High Illumination Uniformity Inverted LED Plant Light Source System[J]. Chinese Journal of Luminescence, 2019,40(9): 1172-1184 DOI： 10.3788/fgxb20194009.1172.

摘要

现有的植物工厂采用"上光下植"的种植模式，培养架的照度均匀度以及混色均匀度不高，导致不同位置的植物生长情况良莠不齐，严重影响工厂生产效益。为解决这一问题，提出一种高照明均匀度植物光源及植物培养架设计方案，将光源"倒置"于种植平面两侧的三棱柱凸台，利用棱柱斜面初次分配光线并提高其分布均匀性，进一步通过培养架顶部反射增加混光距离，提高光线耦合程度，从而提高混色均匀度和照度均匀度。借助TracePro软件对提出的光学结构进行仿真分析，利用Taguchi方法设计并进行实验，最终利用ANOVA理论分析出各因子对品质的影响程度并进一步优化结果，获得照度均匀度为94.30%、混色均匀度为90%的最优设计方案。最后通过测量种植面和植物体表面照度及光谱的分布情况检测植物的生长是否会对光线有遮挡，结果表明该植物照明系统可以保持植物在生长过程中种植面和植物体顶部及侧面都具有良好的照明效果，遮挡问题几乎可以忽略不计，并保证植物生长过程中良好的照明效果。

Abstract

At present

the existing plant factory placed the light source at the top

and the plant was planted at the bottom. The uniformity of illumination and the uniformity of color mixing of the frame are not high

resulting in uneven growth of plants at different locations

which seriously affects the production efficiency of the factory. In order to solve this problem

a high illumination uniformity plant light source and frame design scheme is proposed. The light source is "inverted" on the triangular prism bosses on both sides of the planting surface

and the prism slope is used to distribute light and improve the uniformity of the distribution. Further increasing the light mixing distance and improving the degree of light coupling

thereby the color mixing uniformity and illumination uniformity were imporoved. The proposed optical structure was simulated by TracePro software

and the experiment was carried out by Taguchi method. Finally

the influence degree of each factor was analyzed by ANOVA theory and the result was further optimized. The illumination uniformity of the final design reached 94.30%

and the color mixing uniformity reached 90%. Finally

by measuring the illuminance of the planting surface and the surface of the plant

whether the growth of the plant is obstructed by light was detected

the results show that the plant lighting system can maintain the planting surface and the top and side of the plant with good illumination during the growth process.

关键词

Keywords

references

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