WU Li-fan, MIAO Rui-xia, LI Yong-feng etc. High Sensitivity Hall Devices with AlSb/InAs Quantum Well Structure[J]. Chinese Journal of Luminescence, 2017,38(12): 1650-1653
WU Li-fan, MIAO Rui-xia, LI Yong-feng etc. High Sensitivity Hall Devices with AlSb/InAs Quantum Well Structure[J]. Chinese Journal of Luminescence, 2017,38(12): 1650-1653 DOI: 10.3788/fgxb20173812.1650.
High Sensitivity Hall Devices with AlSb/InAs Quantum Well Structure
An unintentionally doped AlSb/InAs quantum well (QW) structure and a Si- doped quantum well structure on GaAs (001) substrates were grown by molecular beam epitaxy (MBE). The dependence of sheet electron density and electron mobility on the measurement temperature were investigated. It is found that electron mobility as high as 25 000 cm
2
V
-1
s
-1
has been achieved for 300 K in the Si- doped quantum well structure. The Hall devices with high sensitivity and good temperature stability were fabricated based on the Si- doped AlSb/InAs quantum well structures. Their sensitivity is markedly superior to Hall devices of an unintentionally doped AlSb/InAs quantum well.
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ZHANG Y, ZHANG Y W, WANG C Y, et al.. High sensitivity Hall devices with AlSb/InAs quantum well structures[J]. Chin. Phys. B, 2013, 22(5):057106-1-3.
DINGLE R, STORMER H L, GOSSARD A C, et al.. Electron mobilities in modulation-doped semiconductor heterojunction superlattices[J]. Appl. Phys. Lett., 1978, 33(7):665-667.
BENNETT B R, MAGNO R, BOOS J B, et al.. Antimonide-based compound semiconductors for electronic devices:a review[J]. Solid-State Electronics, 2005, 49(12):1875-1895.
TUTTLE G, KROEMER H, ENGLISH J H. Effects of interface layer sequencing on the transport properties of InAs/AlSb quantum wells:evidence for antisite donors at the InAs/AlSb interface[J]. J. Appl. Phys., 1990, 67(6):3032-3040.
朱彦旭, 王岳华, 宋会会, 等. 基于GaN基HEMT结构的传感器件研究进展[J].发光学报, 2016, 37(12):1545-1553. ZHU Y X, WANG Y H, SONG H H, et al.. Progress of sensor elements based on GaN HEMT structure[J]. Chin. J. Lumin., 2016, 37(12):1545-1553. (in Chinese)
WU L F, ZHANG Y M, LV H L, et al.. Atomic-layer-deposited Al2O3 and HfO2 on InAlAs:a comparative study of interfacial and electrical characteristics[J]. Chin. Phys. B, 2016, 25(10):108101-1-5.
MAHER H, BOLOG C R, PINER E L. High-transconductance delta-doped InAs/AlSb HFETs with ultrathin silicon-doped InAs quantum well donor layer[J]. IEEE Electron Dev. Lett., 1998, 19(3):83-85.
WANG J, XING J L, WEI X, et al.. Investigation of high hole mobility In0.41Ga0.59Sb/Al0.91Ga0.09Sb quantum well structures grown by molecular beam epitaxy[J]. Appl. Phys. Lett., 2014, 104(5):052111-1-5.
TANG J S, YU G Q, WANG C Y, et al.. Versatile fabrication of self-aligned nanoscale Hall devices using nanowire masks[J]. Nano Lett., 2016, 16(5):3109-3115.
WANG K, HUANG Y, QIU Y Z, et al.. Magnetic properties of ultrathin CO/Pt multilayer Hall devices irradiated using focused ion beam[J]. Physica B: Condensed Matter, 2015, 476(1):158-160.
CHEN D, ZHAO B Q, ZHANG X. High signal-to-noise ratio Hall devices with a 2D structure of dual -doped GaAs/AlGaAs for low field magnetometry[J]. Chin. Phys. Lett., 2015, 32(12):128502-128506.
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