Preparation of Micro-nano Structure Black Silicon and Discussion of Key Processing Technologies

CHEN Wen; CHEN Le

doi:10.3788/fgxb20173811.1486

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Preparation of Micro-nano Structure Black Silicon and Discussion of Key Processing Technologies

更新时间：2020-08-12

- Preparation of Micro-nano Structure Black Silicon and Discussion of Key Processing Technologies
- Chinese Journal of Luminescence Vol. 38, Issue 11, Pages: 1486-1492(2017)
- 作者机构：
  
  玉林师范学院物理科学与工程技术学院复杂系统优化与大数据处理广西高校重点实验室,广西玉林,537400
- 作者简介：
- 基金信息：
  
  Supported by Yulin Normal University Research Grant(2015YJYB05)
- DOI：10.3788/fgxb20173811.1486
  CLC： O443;O641
- Received：15 April 2017，
  
  Revised：07 September 2017，
  
  Published：05 November 2017
- 稿件说明：
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陈文, 陈乐,. 微纳混合结构黑硅的制备及其关键工艺技术讨论[J]. 发光学报, 2017,38(11): 1486-1492

CHEN Wen, CHEN Le,. Preparation of Micro-nano Structure Black Silicon and Discussion of Key Processing Technologies[J]. Chinese Journal of Luminescence, 2017,38(11): 1486-1492
陈文, 陈乐,. 微纳混合结构黑硅的制备及其关键工艺技术讨论[J]. 发光学报, 2017,38(11): 1486-1492 DOI： 10.3788/fgxb20173811.1486.

CHEN Wen, CHEN Le,. Preparation of Micro-nano Structure Black Silicon and Discussion of Key Processing Technologies[J]. Chinese Journal of Luminescence, 2017,38(11): 1486-1492 DOI： 10.3788/fgxb20173811.1486.

摘要

黑硅是一种能大幅提高器件光电转换效率的新型电子材料，微纳混合结构黑硅是一种比普通黑硅材料更高效的新型黑硅材料，如何制备出大面积、形貌特征好、表面洁净度高的黑硅材料是制备高效的黑硅太阳能电池的前提。首先，利用湿法腐蚀方法，通过设计合适的反应固体装置和良好的工艺控制手段，在金字塔硅表面制备了大面积的微纳混合结构黑硅；然后，对其制备的关键工艺技术进行了研究讨论。实验结果表明，该方法制备的微纳混合结构黑硅具有形貌特征好、表面洁净度高和低表面反射率等特征。有效去除表面银沉积物后，该黑硅在300~1 100 nm范围内的加权平均反射率低至4.06%。该制备工艺方法适用于大面积高效微纳混合结构黑硅的规模制备，在高效黑硅太阳能电池领域具有重要的应用价值。

Abstract

Black silicon is a new type of electronic material which can significantly improve the efficiency of photoelectric conversion device

and the micro-nano structure black silicon is a more efficient novel black silicon material than the ordinary black silicon materials. Preparation of a large area

good appearance characteristics and high surface cleanliness black silicon material is the premise for the preparation of efficient black silicon solar cells. Firstly

using the wet etching method

through the design appropriate reaction device and a good means of process control

the large area micro-nano structures black silicon was prepared by the pyramid silicon. Then

the key processing technologies were discussed. Experimental results show that the micro-nano structures black silicon prepared by this processing method has the characteristics of good appearance characteristics

high surface cleanliness and low surface reflectance. Effectively removing the surface silver deposits

the weighted average reflectivity of the black silicon is as low as 4.06% in the wavelength range of 300-1 100 nm. This preparation method is suitable for the preparation of large area efficient micro-nano structure black silicon

which has important application value in the field of high-efficient black silicon solar cells.

关键词

Keywords

references

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