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Design of Wafer Level Device Irradiation and The Parameters Extraction Equipment Based on X-ray Irradiation
更新时间:2020-08-12
    • Design of Wafer Level Device Irradiation and The Parameters Extraction Equipment Based on X-ray Irradiation

    • Chinese Journal of Luminescence   Vol. 38, Issue 6, Pages: 828-834(2017)
    • DOI:10.3788/fgxb20173806.0828    

      CLC: TP394.1;TH691.9
    • Received:01 November 2016

      Revised:02 January 2017

      Published:05 June 2017

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  • XUN Ming-zhu, LI Yu-dong, GUO Qi etc. Design of Wafer Level Device Irradiation and The Parameters Extraction Equipment Based on X-ray Irradiation[J]. Chinese Journal of Luminescence, 2017,38(6): 828-834 DOI: 10.3788/fgxb20173806.0828.

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