LI Jia-chuan, HE Xin-hua, FAN Jiao-jiao. Structure and Resistive Switching Behaviors of Zn<sub>1-<em>x</em></sub>Cu<sub><em>x</em></sub>O Films Derived by Electrophoretic Deposition[J]. Chinese Journal of Luminescence, 2017,38(5): 594-600
LI Jia-chuan, HE Xin-hua, FAN Jiao-jiao. Structure and Resistive Switching Behaviors of Zn<sub>1-<em>x</em></sub>Cu<sub><em>x</em></sub>O Films Derived by Electrophoretic Deposition[J]. Chinese Journal of Luminescence, 2017,38(5): 594-600 DOI: 10.3788/fgxb20173805.0594.
Structure and Resistive Switching Behaviors of Zn1-xCuxO Films Derived by Electrophoretic Deposition
O films were fabricated on FTO substrates by electrophoretic deposition. The microstructure
PL spectra
I-V
characteristics
retention measurement and switching voltage distribution were investigated. PL spectra indicate that Cu doping introduces deep acceptor level in the bandgap and decreases the concentration of oxygen vacancy
which result in the decreasing intensity of ultraviolet
blue and green luminescence. The deposited films are dense and uniform
and exhibit bipolar resistive switching behaviors with a high OFF/ON ratio of 10
5
. The resistive switching behaviors are governed by Ohm's law in the LRS and space charge limited conduction (SCLC) in the HRS
respectively. Good endurance characteristics can be retained after 100 switching cycles without any obvious fluctuation in
R
off
/
R
on
ratio. Cu
2+
doping has little influence on low resistance state (LRS)
but decreases the dispersion in high resistance state (HRS) and switching voltage
V
SET
. When Cu doping content
x
=0.04
the devices show good properties:
R
off
10
6
R
off
/
R
on
10
4
and the value of
V
SET
is 0.4-3.03 V.
关键词
Keywords
references
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