MA Hang, LI Deng-hua, CHEN Wen-bai etc. Influence of Thickness of Electron Transport Layer and Block Layer on The Properties of Quantum Dot Light Emitting Diodes[J]. Chinese Journal of Luminescence, 2017,38(1): 85-90
MA Hang, LI Deng-hua, CHEN Wen-bai etc. Influence of Thickness of Electron Transport Layer and Block Layer on The Properties of Quantum Dot Light Emitting Diodes[J]. Chinese Journal of Luminescence, 2017,38(1): 85-90 DOI: 10.3788/fgxb20173801.0085.
Influence of Thickness of Electron Transport Layer and Block Layer on The Properties of Quantum Dot Light Emitting Diodes
In view of carrier injection unbalance problem of the quantum dot light emitting diode (QLED)
the injection rate of holes and electrons in the quantum dots (QDs) layer was studied. QLED with structure of ITO/PEDOT:PSS/Poly-TPD/QDs/Alq
3
was fabricated. The experiment results show that all the devices exhibit red light and the turn-on voltage rises as the Alq
3
thickness increases from 25 nm to 45 nm. When the Alq
3
thickness is 30 nm
the current efficiency of the device is high and the injection rate of holes and electrons in the QDs layer reaches a relative balance. Then
the luminescence properties of the devices were further studied through imbedding an electron blocking layer TPD into the QDs/Alq
3
interface. When the TPD thickness is 1 nm
the device still exhibits red light
and green light begins to appear when the TPD thickness is 3 nm and 5 nm. The experiment results show that a thinner thickness and lower LUMO should be chosen for the electron blocking layer.
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references
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