Investigation of Electron Excitation Temperature of Helium Plasma in Coaxial Hollow Cathode Discharge

LIU Yao-ze; YUAN Cheng-xun; GAO Rui-lin; JIA Jie-shu; ZHOU Zhong-xiang

doi:10.3788/fgxb20163710.1299

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Investigation of Electron Excitation Temperature of Helium Plasma in Coaxial Hollow Cathode Discharge

更新时间：2020-08-12

- Investigation of Electron Excitation Temperature of Helium Plasma in Coaxial Hollow Cathode Discharge
- Chinese Journal of Luminescence Vol. 37, Issue 10, Pages: 1299-1304(2016)
- 作者机构：
  
  哈尔滨工业大学物理系,黑龙江哈尔滨,150001
- 作者简介：
- 基金信息：
- DOI：10.3788/fgxb20163710.1299
  CLC： O432.1+1
- Received：29 April 2016，
  
  Revised：13 June 2016，
  
  Published：05 October 2016
- 稿件说明：
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刘耀泽, 袁承勋, 高瑞林等. 同轴空心阴极氦等离子体的电子激发温度研究[J]. 发光学报, 2016,37(10): 1299-1304

LIU Yao-ze, YUAN Cheng-xun, GAO Rui-lin etc. Investigation of Electron Excitation Temperature of Helium Plasma in Coaxial Hollow Cathode Discharge[J]. Chinese Journal of Luminescence, 2016,37(10): 1299-1304
刘耀泽, 袁承勋, 高瑞林等. 同轴空心阴极氦等离子体的电子激发温度研究[J]. 发光学报, 2016,37(10): 1299-1304 DOI： 10.3788/fgxb20163710.1299.

LIU Yao-ze, YUAN Cheng-xun, GAO Rui-lin etc. Investigation of Electron Excitation Temperature of Helium Plasma in Coaxial Hollow Cathode Discharge[J]. Chinese Journal of Luminescence, 2016,37(10): 1299-1304 DOI： 10.3788/fgxb20163710.1299.

摘要

利用同轴空心阴极放电装置，产生氦低温等离子体。通过对等离子体的发射光谱进行测量和计算，研究放电功率以及氦气压强对等离子体的电子激发温度的影响。结果表明：氦低温等离子体的发射光谱主要由连续谱和原子谱线构成，放电功率和压强对谱线的强度具有明显影响。压强的变化不仅影响电子从电场中获得的能量，还会影响电子与原子的碰撞频率，从而导致电子激发温度随着氦气压强的增大，出现先上升后下降的变化趋势。

Abstract

Low temperature helium plasma was generated using the coaxial hollow cathode configuration. In order to study the impact of the discharge power as well as the pressure of helium on the electron excitation temperature of plasma

calculation was performed based on the emission spectra data of plasma under different discharge conditions acquired by fiber optic spectrometer. The variation of electron excitation temperature was analyzed in relation to different experimental parameters. The results demonstrate that the emission spectra of low temperature helium plasma are comprised of continuum emission and the atomic spectrum of helium. The intensity of spectral lines change dramatically under different discharge conditions

although no visible shift of lines is observed. The electron excitation temperature increases almost linearly with the discharge power

rising from 5 566.4 K to 5 855.3 K

which is mainly owing to the growing acquisition of energy from the electric field. With the growth of helium pressure

the electron excitation temperature increases gradually from 5 203.7 K at 15 Pa to 5 941.3 K at 55 Pa

before decreasing slowly to 5 855.3 K at 75 Pa. This is because that the pressure will not only affect the averaged energy of the electrons gained in the electric field

but also the collision frequency between electrons and He atoms. By selecting proper discharge parameters of the coaxial hollow cathode system

the electron excitation temperature of helium plasma can be controlled.

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references

倪新亮,金凡亚,沈丽如,等. 等离子体处理碳纤维/树脂复合材料 [J]. 复合材料学报, 2015, 32(3):721-727. NI X L, JIN F Y, SHEN L R, et al.. Carbon fiber/resin composites treated by plasma [J]. Acta Mater. Comp. Sinica, 2015, 32(3):721-727. (in Chinese)

李华琴,何觉聪,陈洲洋,等. 低温等离子体生物法处理硫化氢气体研究 [J]. 环境科学, 2014, 35(4):1256-1262. LI H Q, HE J C, CHEN Z Y, et al.. Hydrogen sulfide removal by the combination of non-thermal plasma and biological process [J]. Environ. Sci., 2014, 35(4):1256-1262. (in Chinese)

王云华,周路,乔忠良,等. 氩、氢混合等离子体处理对GaAs表面性质及发光特性的影响 [J]. 发光学报, 2013, 34(3):308-313. WANG Y H, ZHOU L, QIAO Z L, et al.. Effects of Ar and H2 plasma treatment on the surface character and luminescence properties of GaAs substrates [J]. Chin. J. Lumin., 2013, 34(3):308-313. (in Chinese)

陈金忠,王敬,宋广聚,等. 样品温度对激光诱导土壤等离子体辐射特性的影响 [J]. 光子学报, 2015, 44(5):0530001. CHEN J Z, WANG J, SONG G J, et al.. The effect of sample temperature on the laser-induced plasma radiation characteristics [J]. Acta Photon. Sinica, 2015, 44(5):0530001. (in Chinese)

邵长勇,方宪法,唐欣,等. 冷等离子体处理对大葱种子发芽特性的影响 [J]. 农业机械学报, 2013, 44(6):201-205. SHAO C Y, FANG X F, TANG X, et al.. Effects of low-temperature plasma on seed germination characteristics of green onion [J]. Trans. Chin. Soc. Agric. Mach., 2013, 44(6):201-205. (in Chinese)

屠昕,陆胜勇,严建华,等. 大气压直流氩等离子体光谱诊断研究 [J]. 光谱学与光谱分析, 2006, 26(10):1785-1789. TU X, LU S Y, YAN J H, et al.. Spectroscopic diagnostics of DC argon plasma at atmospheric pressure [J]. Spectrosc. Spect. Anal., 2006, 26(10):1785-1789. (in Chinese)

RESTREPO E, RAMREZ W, DEVIA A. Temperature and density measurements for pulsed plasmas using spectroscopy methods [C]. AIP Conference Proceedings, Berlin, Germany, 2000, 559:211-215.

JIA J S, YUAN C X, GAO R L, et al.. Propagation of electromagnetic waves in weakly ionized dusty plasma [J]. J. Phys. D: Appl. Phys., 2015, 48(46):465201.

刘晓东,郑晓泉,张要强,等. 低温等离子体的诊断方法 [J]. 绝缘材料, 2006, 39(2):43-46. LIU X D, ZHENG X Q, ZHANG Y Q, et al.. The diagnostic methods of low-temperature plasma [J]. Insul. Mater., 2006, 39(2):43-46.(in Chinese)

孙成琪,高阳,杨德明,等. 低压下直流电弧热等离子体射流电子密度的光谱法测量 [J]. 发光学报, 2015, 36(1):88-93. SUN C Q, GAO Y, YANG D M, et al.. Spectroscopic method for measurement of electron number density on DC arc plasma jet under low pressure conditions [J]. Chin. J. Lumin., 2015, 36(1):88-93. (in Chinese)

KUNZE H J. 等离子体光谱学导论 [M]. 北京:北京大学出版社, 2013:179-187. KUNZE H J. Introduction to Plasma Spectroscopy [M]. Beijing: Peking University Press, 2013:179-187. (in Chinese)

孙成琪,高阳,杨德明,等. 大气热喷涂等离子体射流中电子温度和电子密度的测量 [J]. 真空科学与技术学报, 2013, 33(12):1209-1213. SUN C Q, GAO Y, YANG D M, et al.. Characterization of electron density and temperature in atmospheric thermal plasma spray [J]. Chin. J. Vac. Sci. Technol., 2013, 33(12):1209-1213. (in Chinese)

董丽芳,李永辉. 大气压氩气射流等离子体放电发展速度研究 [J]. 发光学报, 2014, 35(4):476-480. DONG L F, LI Y H. Propagation velocity in hollow needle to plate discharge [J]. Chin. J. Lumin., 2014, 35(4):476-480. (in Chinese)

刘卫国,伍艺龙. 射频辉光放电氩等离子体诊断分析 [J]. 西安工业大学学报, 2011, 31(3):205-209. LIU W G, WU Y L. Characteristics of RF-generated argon plasma [J]. J. Xi'an Technol. Univ., 2011, 31(3):205-209. (in Chinese)

吴明忠,田修波,李幕勤,等. 笼网型空心阴极氩气放电特性研究 [J]. 真空科学与技术学报, 2015, 35(3):323-329. WU M Z, TIAN X B, LI M Q, et al.. Discharge behavior of hollow cathode housed in mesh-cage [J]. Chin. J. Vac. Sci. Technol., 2015, 35(3):323-329. (in Chinese)

许建平,巩春志,田修波. 低气压射频空心阴极放电氩等离子体发射光谱分析 [J]. 真空科学与技术学报, 2013, 33(10):980-984. XU J P, GONG C Z, TIAN X B. Emission characteristics of argon plasma generated by RF hollow cathode discharge at low pressure [J]. Chin. J. Vac. Sci. Technol., 2013, 33(10):980-984. (in Chinese)

何寿杰,刘淑敏,刘志强,等. 槽型空心阴极放电特性的模拟 [J]. 高电压技术, 2015, 41(2):516-522. HE S J, LIU S M, LIU Z Q, et al.. Simulation on the characteristics of a slotted hollow cathode discharge [J]. High Volt. Eng., 2015, 41(2):516-522. (in Chinese)

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