Structural and Optical Properties of SnS Films Prepared by RF Magnetron Sputtering

LIU Dan-dan; LI Xue-liu; LI Lin; SHI Cheng-wu; LIANG Qi

doi:10.3788/fgxb20163709.1114

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Structural and Optical Properties of SnS Films Prepared by RF Magnetron Sputtering

更新时间：2020-08-12

- Structural and Optical Properties of SnS Films Prepared by RF Magnetron Sputtering
- Chinese Journal of Luminescence Vol. 37, Issue 9, Pages: 1114-1123(2016)
- 作者机构：
  
  1. 合肥工业大学电子科学与应用物理学院, 安徽合肥 230009
  2. 合肥工业大学化学与化工学院, 安徽合肥 230009
- 作者简介：
- 基金信息：
- DOI：10.3788/fgxb20163709.1114
  CLC： O484;TN304
- Received：01 May 2016，
  
  Revised：06 June 2016，
  
  Published：05 September 2016
- 稿件说明：
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刘丹丹, 李学留, 李琳等. 射频磁控溅射法制备SnS薄膜及其结构和光学特性[J]. 发光学报, 2016,37(9): 1114-1123

LIU Dan-dan, LI Xue-liu, LI Lin etc. Structural and Optical Properties of SnS Films Prepared by RF Magnetron Sputtering[J]. Chinese Journal of Luminescence, 2016,37(9): 1114-1123
刘丹丹, 李学留, 李琳等. 射频磁控溅射法制备SnS薄膜及其结构和光学特性[J]. 发光学报, 2016,37(9): 1114-1123 DOI： 10.3788/fgxb20163709.1114.

LIU Dan-dan, LI Xue-liu, LI Lin etc. Structural and Optical Properties of SnS Films Prepared by RF Magnetron Sputtering[J]. Chinese Journal of Luminescence, 2016,37(9): 1114-1123 DOI： 10.3788/fgxb20163709.1114.

摘要

利用射频磁控溅射法在玻璃衬底上沉积SnS薄膜并对其进行快速退火处理，利用X射线衍射（XRD）、拉曼光谱（Raman）、X射线能量色散谱（EDS）、原子力显微镜（AFM）和紫外-可见-近红外（UV-Vis-NIR）分光光度计研究了不同溅射功率（60～120 W）条件下制备的SnS薄膜的晶体结构、物相组成、化学组分、表面形貌以及有关光学特性。结果表明：经快速退火的薄膜均已结晶，提高溅射功率有利于改善薄膜的结晶质量、生长择优取向程度和化学配比，薄膜的平均颗粒尺寸呈增大趋势；溅射功率为100 W的薄膜样品的结晶质量和择优取向度高，薄膜应变最小，且为纯相SnS薄膜，Sn/S组分的量比为1：1.09，吸收系数达10

-1

量级，直接禁带宽度为1.54 eV。

Abstract

SnS thin films were prepared on glass substrates by RF magnetron sputtering technique and then were rapidly annealed. The crystalline structure

phase composition

chemical composition

surface morphology and relevant optical properties of SnS thin films grown under various sputtering power (60-120 W) are investigated by X-ray diffraction (XRD)

Raman spectroscopy (Raman)

energy dispersive X-ray spectroscopy (EDS)

atomic force microscopy (AFM) and ultraviolet-visible-near infrared spectrophotometry (UV-Vis-NIR). The results show that all the rapidly annealed thin films are crystallized. The crystalline quality

degree of preferential orientation and stoichiometry of thin films are improved and the average particle sizes of thin films are enlarged by the increase of sputtering power. Under the condition of sputtering power of 100 W

the sample has high crystalline quality and degree of preferential orientation

the least strain

pure-phase SnS thin film

Sn/S mole ratio of 1:1.09

the absorption coefficient of 10

-1

and the direct band-gap of 1.54 eV.

关键词

Keywords

references

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Related Author

YU Liang

LIANG Qi

LIU Lei

MA Ming-jie

SHI Cheng-wu

LI Xue-liu

LIU Dan-dan

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Related Institution

合肥工业大学化学与化工学院

合肥工业大学电子科学与应用物理学院

The Center for Industrial Technology Innovation and Development of Bijie

State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering， Institute of Optics and Electronics， Chinese Academy of Sciences

College of Physics and Optoelectronic Engineering， Taiyuan University of Technology

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