Maskless Plasma Etching of Diamond Cones and The Morphology Evolution Mechanism

SUN Peng; WANG Chao; YUAN Guang; LI Jun-jie; GU Chang-zhi

doi:10.3788/fgxb20163707.0793

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Maskless Plasma Etching of Diamond Cones and The Morphology Evolution Mechanism

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- Maskless Plasma Etching of Diamond Cones and The Morphology Evolution Mechanism
- Chinese Journal of Luminescence Vol. 37, Issue 7, Pages: 793-797(2016)
- 作者机构：
  
  1. 中国海洋大学信息科学与工程学院物理系,山东青岛,266100
  2. 中国科学院物理研究所北京凝聚态国家实验室北京,100190
- 作者简介：
- 基金信息：
- DOI：10.3788/fgxb20163707.0793
  CLC： TN383+.1
- Received：17 February 2016，
  
  Revised：21 March 2016，
  
  Published：05 July 2016
- 稿件说明：
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孙鹏, 王超, 元光等. 金刚石锥阵列的无掩膜刻蚀制备及其形貌演变机制[J]. 发光学报, 2016,37(7): 793-797

SUN Peng, WANG Chao, YUAN Guang etc. Maskless Plasma Etching of Diamond Cones and The Morphology Evolution Mechanism[J]. Chinese Journal of Luminescence, 2016,37(7): 793-797
孙鹏, 王超, 元光等. 金刚石锥阵列的无掩膜刻蚀制备及其形貌演变机制[J]. 发光学报, 2016,37(7): 793-797 DOI： 10.3788/fgxb20163707.0793.

SUN Peng, WANG Chao, YUAN Guang etc. Maskless Plasma Etching of Diamond Cones and The Morphology Evolution Mechanism[J]. Chinese Journal of Luminescence, 2016,37(7): 793-797 DOI： 10.3788/fgxb20163707.0793.

摘要

为获得具有优良场发射性能的金刚石锥阵列

利用偏压热灯丝化学气相沉积系统分别在高质量大颗粒金刚石厚膜与纳米金刚石薄膜上进行了无掩膜刻蚀研究

系统比较了高质量大颗粒金刚石厚膜与纳米金刚石薄膜的刻蚀特性

制备了大面积均匀金刚石锥阵列和高长径比(20:1)金刚石纳米线阵列

探讨了金刚石锥的刻蚀形成机理。

Abstract

In order to obtain the diamond cones with high field emission property

the etching characteristics of high-quality diamond thick film and nano-crystalline diamond films were studied by using the bias voltage assisted hot filament chemical vapor deposition (BA-HFCVD) method

the diamond cones with high aspect ratio of 20:1 in a large area were fabricated by optimizing etching condition

in addition

the formation mechanism of the diamond cone was studied in detail.

关键词

Keywords

references

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