您当前的位置:
首页 >
文章列表页 >
Nitrogen-plasma Passivation of GaAs Semiconductor Surface
更新时间:2020-08-12
    • Nitrogen-plasma Passivation of GaAs Semiconductor Surface

    • Chinese Journal of Luminescence   Vol. 37, Issue 4, Pages: 428-431(2016)
    • DOI:10.3788/fgxb20163704.0428    

      CLC: TN248.4
    • Received:07 January 2016

      Revised:03 March 2016

      Published:05 April 2016

    移动端阅览

  • XU Liu-yang, GAO Xin, YUAN Xu-ze etc. Nitrogen-plasma Passivation of GaAs Semiconductor Surface[J]. Chinese Journal of Luminescence, 2016,37(4): 428-431 DOI: 10.3788/fgxb20163704.0428.

  •  
  •  

0

Views

350

下载量

3

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

Degradation Mechanism of Pd/p-GaN Ohmic Contacts
Luminescence Properties of all Inorganic Perovskite CsPbBr3 Quantum Dots and Film Synthesized by Cesium Acetate
Surface and Luminescence Properties of GaAs(100) by Hydrazine Solution Passivation
RF Sulfur-plasma Passivation of GaAs(100) Surface
Properties of InGaAs Deposited on GaAs Substrate with Two-step Growth

Related Author

Hui YANG
Fan ZHANG
Rong-xin WANG
Si-yi HUANG
Ai-qin TIAN
Jian-ping LIU
Guo-guang WU
Xin DONG

Related Institution

Vacuum Interconnected Nanotech Workstation, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences
School of Physical Science and Technology, Shanghai Tech University
Key Laboratory of Nano-devices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences
State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University
State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
0