WANG Yu-chao, ZHANG Quan-lin, SU Long-xing etc. Growth of ZnO Single Crystal and BeZnO Alloy and Ultraviolet Detector[J]. Chinese Journal of Luminescence, 2015,36(11): 1233-1239
WANG Yu-chao, ZHANG Quan-lin, SU Long-xing etc. Growth of ZnO Single Crystal and BeZnO Alloy and Ultraviolet Detector[J]. Chinese Journal of Luminescence, 2015,36(11): 1233-1239 DOI: 10.3788/fgxb20153611.1233.
Growth of ZnO Single Crystal and BeZnO Alloy and Ultraviolet Detector
To develop ZnO-based deep ultraviolet (UV) detectors
high-quality ZnO and Be
x
Zn
1-x
O films were grown on c-plane of sapphire substrates using plasma-assisted molecular beam epitaxy (PAMBE). X-ray photoelectron spectroscopy (XPS) tests showed that the mole fractions of Be in Be
x
Zn
1-x
O alloys followed by 1.8%
4.9%
8.0%
15.3%
respectively. Prototypes of ZnO ultraviolet detectors with the metal-semiconductor-metal (MSM) structure were fabricated and tested
which showed a large on/off ratio and high responsivity
as well as the demonstration of blue-shift tuning of responsivity for Be
x
Zn
1-x
O-based detectors with Be doping. The cut-off response wavelength of Be
0.153
Zn
0.847
O detectors is 366 nm
moreover
the device has good signal-to-noise up to 2-3 orders of magnitude. These achievements should provide valuable insights and experiences for the ZnO-based materials and devices. Moreover
oxygen plasma surface treatment was studied to probe the influence on dark current. By appropriate surface treatment
the dark current of ZnO detector can be reduced by 4 orders of magnitude.
关键词
Keywords
references
Tang Z K, Wong G K L, Yu P, et al. Room-temperature ultraviolet laser emission from self-assembled ZnO microcrystallite thin films [J]. Appl. Phys. Lett., 1998, 72(25):3270-3272.
Bagnall D M, Chen Y F, Zhu Z, et al. Optically pumped lasing of ZnO at room temperature [J]. Appl. Phys. Lett., 1997, 70(17):2230-2232.
Fan X M, Lian J S, Guo Z X, et al. Microstructure and photoluminescence properties of ZnO thin films grown by PLD on Si(111) substrates [J]. Appl. Surf. Sci., 2005, 239(2):176-181.
Tanaka H, Fujita S, Fujita S. Fabrication of wide-band-gap MgxZn1-x O quasi-ternary alloys by molecular-beam epitaxy [J]. Appl. Phys. Lett., 2005, 86(19):192911-1-3.
Ohtomo A, Kawasaki M, Koida T, et al. MgxZn1-x O as a Ⅱ-Ⅵ wide-gap semiconductor alloy [J]. Appl. Phys. Lett., 1998, 72(19):2466-2468.
Gao L L, Xu Y, Zhang M, et al. Effects of Mg content on the optical properties of MgZnO films [J]. Chin. J. Liq. Cryst. Disp.(液晶与显示), 2014, 29(3):351-354 (in Chinese).
Wang Y C, Wu T Z, Chen M M, et al. Comparative study of polar and non-polar BeZnO films grown by plasma-assisted molecular beam epitaxy [J]. Chin. J. Lumin.(发光学报), 2013, 34(11):1483-1488 (in Chinese).
Su L X, Zhu Y, Zhang Q L, et al. Structure and optical properties of ternary alloy BeZnO and quaternary alloy BeMgZnO films growth by molecular beam epitaxy [J]. Appl. Surf. Sci., 2013, 274(6):341-344.
Su L X, Zhu Y, Chen M M, et al. Temperature-dependent structural relaxation of BeZnO alloys [J]. Appl. Phys. Lett., 2013, 103(7):072104-1-3.
Yu J H, Kim J H, Yang H J, et al. Wide band-gap investigation of modulated BeZnO layers via photocurrent measurement [J]. J. Mater. Sci., 2012, 47(14):5529-5534.
Wang Y C, Wu T Z, Su L X, et al. Luminescence characteristics of high-quality ZnO and BeZnO films [J]. Chin. J. Lumin.(发光学报), 2013, 34(8):1035-1039 (in Chinese).
Ryu Y R, Lee T S, Lubguban J A, et al. Wide-band gap oxide alloy: BeZnO [J]. Appl. Phys. Lett., 2006, 88(5):052103-1-4.
Ryu Y R, Lee T S, Lubguban J A, et al. Next generation of oxide photonic devices: ZnO-based ultraviolet light emitting diodes [J]. Appl. Phys. Lett., 2006, 88(24):241108-1-3.
Liu C Y, Zhang B P, Lu Z W, et al. Fabrication and characterization of ZnO film based UV photodetector [J]. J. Mater. Sci: Mater. Elect., 2008, 20(3):197-201.
Wang L K, Ju Z G, Zhang J Y, et al. Single-crystalline cubic MgZnO films and their application in deep-ultraviolet optoelectronic devices [J]. Appl. Phys. Lett., 2009, 95(13):131113-1-3.
Du X L, Mei Z X, Liu Z L, et al. Controlled growth of high-quality ZnO-based films and fabrication of visible-blind and solar-blind ultra-violet detectors [J]. Adv. Mater., 2009, 21(45):4625-4630.
Liu K W, Sakurai M, Aono M. ZnO-based ultraviolet photodetectors [J]. Sensors-Basel, 2010, 10(9):8604-8634.
Shen D Z, Mei Z X, Liang H L, et al. ZnO-based matierial, heterojunction and photoelctronic device [J]. Chin. J. Lumin.(发光学报), 2014, 35(1):1-60 (in Chinese).
Liang H S, Liu Y, Huo Z, et al. ZnO Schottky ultraviolet photodetectors [J]. J. Cryst. Growth, 2001, 225:110-113.
Wang L K, Ju Z G, Zhang J Y, et al. Single-crystalline cubic MgZnO films and their application in deep-ultraviolet optoelectronic devices [J]. Appl. Phys. Lett., 2009, 95(13):131113-1-3.
Hou Y N, Mei Z X, Liang H L, et al. Comparative study of n-MgZnO/p-Si ultraviolet-B photodetector performance with different device structures [J]. Appl. Phys. Lett., 2011, 98(26):263501-1-3.
Chen M M, Zhang Q L, Su L X, et al. ZnO film with ultra-low background electron concentration grown by plasma-assisted MBE using Mg film as the buffer layer [J]. Mater. Res. Bull., 2012, 47(9):2673-2675.
Su L X, Zhu Y, Yong D Y, et al. Wide range bandgap modulation based on ZnO-based alloys and fabrication of solar blind UV detectors with high rejection ratio [J]. ACS Appl. Mater. Interf., 2014, 6(16):14152-14158.
Liu M, Kim H K. Ultraviolet detection with ultrathin ZnO epitaxial films treated with oxygen plasma [J]. Appl. Phys. Lett., 2004, 84(2):173-175.
Angadi B, Park H, Choi H, et al. Oxygen plasma treated epitaxial ZnO thin films for Schottky ultraviolet detection [J]. J. Phys D: Appl. Phys., 2007, 40(5):1422-1426.
Zhai Y J, Li J H, Chen X Y, et al. Synthesis and characterization of Cd-doped ZnO nanoflowers and its photocatalytic activity [J]. Chin. Opt.(中国光学), 2014, 7(1):124-130 (in Chinese).
Wang Y C, Wu T Z, Chen M M, et al. Well-controlled wet etching of ZnO films using hydrogen peroxide solution [J]. Appl. Surf. Sci., 2014, 292(1):34-38.