LI Xiu-shan, NING Yong-qiang, ZHANG Xing etc. Influence of Grating Parameters on Reflectivity of Si/SiO<sub>2</sub> High Contrast Gratings[J]. Chinese Journal of Luminescence, 2015,36(7): 806-810
LI Xiu-shan, NING Yong-qiang, ZHANG Xing etc. Influence of Grating Parameters on Reflectivity of Si/SiO<sub>2</sub> High Contrast Gratings[J]. Chinese Journal of Luminescence, 2015,36(7): 806-810 DOI: 10.3788/fgxb20153607.0806.
Influence of Grating Parameters on Reflectivity of Si/SiO2 High Contrast Gratings
In order to solve the problem of poor stability of high contrast gratings (HCGs) for 850 nm VCSEL
a new type of Si/SiO
2
HCGs was put forward. The influence of grating parameters on HCG reflectivity of 850 nm was studied. The influence of the grating parameters
such as height
fill factor
duty
etching depth
angle
on the reflectivity of Si/SiO
2
HCGs for 850 nm was simulated and analyzed by the finite element analysis software. For the 850 nm TE light incidence from SiO
2
to the rectangular HCGs
it is found that only when the angle of gating is greater than 88
can the reflectivity of HCGs be greater than 0.995
and other parameters of HCGs have a larger tolerance.
关键词
Keywords
references
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