We reported the photoconductivity of Mg-doped p-InN layers
which were grown by molecular beam epitaxy (MBE). The surface of these samples was very flat which were observed by both reflection high energy electron diffraction (RHEED) and atomic force microscope (AFM). We studied the temperature-dependent photoconductivity of Mg-doped p-InN layers. We found out that the photosensitivity decreased with increasing temperature
which resulted from both the variation of photon-generated carrier concentration and the residual carrier concentration with increasing temperature.
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references
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