您当前的位置:
首页 >
文章列表页 >
Design and Incident Angle Directionality Optimization of A Tapered Grating Coupler for 1 550 nm VCSEL-based Silicon Photonic Integration
Device Fabrication and Physics | 更新时间:2025-04-21
    • Design and Incident Angle Directionality Optimization of A Tapered Grating Coupler for 1 550 nm VCSEL-based Silicon Photonic Integration

      增强出版
    • Chinese Journal of Luminescence   Vol. 46, Issue 4, Pages: 730-741(2025)
    • DOI:10.37188/CJL.20240342    

      CLC: TN256
    • CSTR:32170. 14. CJL. 20240342    
    • Received:24 December 2024

      Revised:14 January 2025

      Published:25 April 2025

    移动端阅览

  • SUN Songwei,SHI Linlin,MA Chao,et al.Design and Incident Angle Directionality Optimization of A Tapered Grating Coupler for 1 550 nm VCSEL-based Silicon Photonic Integration[J].Chinese Journal of Luminescence,2025,46(04):730-741. DOI: 10.37188/CJL.20240342. CSTR: 32170. 14. CJL. 20240342.

  •  
  •  

0

Views

38

下载量

0

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

Analysis of Coupling Tolerance in Laser Packaging
Stable Coupling Efficiency of Semiconductor Lasers with Groove Structure
Research Progreess on Waveguide Gratings for Lntegrated Optics
FABRICATING OF WAVEGUIDE GRATING BY PHASE MASK TECHNIQUE

Related Author

WANG Yukun
ZHANG Cai
LIU Jiayao
WANG Qingqing
CUI Bi-feng
LI Sha
KONG Zhen-zhen
HUANG Xin-zhu

Related Institution

State Key Laboratory of Applied Optics , Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
School of Intelligent and Electronic Engineering, Dalian Neusoft University of Information
Institute of Semiconductor, Chinese Academy of Sciences
Xinlianxin (Hebei Xiong’an) Technology Co., Ltd., Xiongan
Key Laboratory of Opto-electronics Technology, Ministry of Education, Beijing University of Technology
0