Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence
Synthesis and Properties of Materials|更新时间:2025-08-03
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Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence
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“The latest research reveals the significant impact of GaAs insertion layer on the luminescence performance of InGaAs multi quantum well materials in the 905 nm wavelength band, providing new ideas for improving material performance.”
Chinese Journal of LuminescenceVol. 45, Issue 12, Pages: 2011-2020(2024)
作者机构:
1.长春理工大学 高功率半导体激光国家重点实验室, 吉林 长春 130022
2.长春理工大学 重庆研究院, 重庆 401135
3.陆军装备部驻长春地区第一军事代表室, 吉林 长春 130000
作者简介:
基金信息:
Chongqing Natural Science Foundation Project(cstc2021jcyjmsxmX1060;CSTB2022NSCQ-MSX0401);The Developing Project of Science and Technology of Jilin Province(20210101473JC)
GAN Lulu,WANG Haizhu,ZHANG Chong,et al.Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence[J].Chinese Journal of Luminescence,2024,45(12):2011-2020.
GAN Lulu,WANG Haizhu,ZHANG Chong,et al.Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence[J].Chinese Journal of Luminescence,2024,45(12):2011-2020. DOI: 10.37188/CJL.20240243.
Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence增强出版