Preparation and Electric Performance of Ag Films as Field Emission Display Electrodes

ZENG Xiang-yao; YE Yun; YUAN Jun-lin; GUO Tai-liang

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Preparation and Electric Performance of Ag Films as Field Emission Display Electrodes

paper | 更新时间：2020-08-12

- Preparation and Electric Performance of Ag Films as Field Emission Display Electrodes
- Chinese Journal of Luminescence Vol. 30, Issue 5, Pages: 706-711(2009)
- 作者机构：
  
  福州大学物理与信息工程学院, 福建福州 350002
- 作者简介：
- 基金信息：
- DOI：
  CLC： O484.1;O484.4+2
- Received：08 December 2008，
  
  Revised：02 January 1900，
  
  Published Online：30 October 2009，
  
  Published：30 October 2009
- 稿件说明：
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ZENG Xiang-yao, YE Yun, YUAN Jun-lin, et al. Preparation and Electric Performance of Ag Films as Field Emission Display Electrodes[J]. Chinese journal of luminescence, 2009, 30(5): 706-711.
DOI：

ZENG Xiang-yao, YE Yun, YUAN Jun-lin, et al. Preparation and Electric Performance of Ag Films as Field Emission Display Electrodes[J]. Chinese journal of luminescence, 2009, 30(5): 706-711. DOI：

摘要

场发射显示(FED)被认为是CRT的平板化

受到人们关注。作者采用直流磁控溅射法

在Al

过渡层上制备面心立方结构的Ag多晶薄膜。通过XRD、SEM、AFM测试分析发现

溅射功率分为两个区域

在溅射功率不高于2.8 kW时

沉积速率随着功率线性增大

得到Ag膜晶粒尺寸均一

薄膜电阻率逐步降低;溅射功率高于2.8 kW后

沉积速率没有显著增大

出现较多的大晶粒

电阻率升高

并且从理论上给出了解释。综合来看

溅射功率在2.8 kW所制备的Ag膜微观结构质量达到最佳

电阻率也达到最小值。

Abstract

By using direct current (DC) magnetron sputtering method

silver films were deposited on large area plane glasses

which were pre-deposited with Al

films with thickness of 25 nm. The relationships between sputtering power and deposited rate

surface microstructure and electric resistivity of silver films were studied. When sputtering power is lower than 2.8 kW

the deposited rate increases steadily with sputtering power

and homogeneous silver films with decreasing electric resistivity were obtained. However

silver films with abnormally large grains and increasing electric resistivity were fabricated when sputtering power is more than 2.8 kW. Silver film with the best microstructure and the lowest electric resistivity is obtained at the sputtering power of 2.8 kW.

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references

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