JIANG Da-yong, ZHANG Ji-ying, SHAN Chong-xin, LÜ You-ming, ZHAO Yan-min, HAN Shun, YAO Bin, ZHANG Zhen-zhong, ZHAO Dong-xu, SHEN De-zhen, FAN X W. Solar-blind Photodetectors Based on MgZnO Thin Films[J]. Chinese Journal of Luminescence, 2008,29(4): 743-746
JIANG Da-yong, ZHANG Ji-ying, SHAN Chong-xin, LÜ You-ming, ZHAO Yan-min, HAN Shun, YAO Bin, ZHANG Zhen-zhong, ZHAO Dong-xu, SHEN De-zhen, FAN X W. Solar-blind Photodetectors Based on MgZnO Thin Films[J]. Chinese Journal of Luminescence, 2008,29(4): 743-746DOI:
Solar-blind Photodetectors Based on MgZnO Thin Films
solar-blind photodetectors have attracted much attention due to their applications in missile plume sensors
flame detectors
chemical-biological agent sensors
and space-to-space communications.MgZnO appears to be an ideal material for the development of solar-blind photodetectors because it possess unique figures of merit
such as availability of lattice-matched single-crystal substrates
tunable band-gap(3.3 to 7.8 eV)
relative low growth temperatures(100~750℃)
and high radiation hardness.In this paper
we demonstrate a solar-blind MgZnO photodetector made from MgZnO films.The peak responsivity of the detector lies at 225 nm
and cutoff wavelength at 230 nm.Solar-blind photodetectors based on MgZnO thin films were fabricated through two steps:the preparation of Mg
0.7
Zn
0.3
O thin films and the interdigital Au-electrodes.The experimental procedure was as follows:Firstly
high-purity Mg
0.5
Zn
0.5
O ceramic disk was used as the target.The sputtering chamber was evacuated down to 3×10
-4
Pa before introducing the sputtering gas.Ar and O
2
gases were introduced into the sputtering chamber through two separate mass flow controllers with the rates of 60 and 20 sccm(standard cubic centimeter per minute)
respectively.The working pressure in chamber was kept at 1 Pa
the substrate temperature at about 450℃
and the rf power at 100 W.The sputtering process lasted one hour
then the films were taken out of the growth chamber.Energy-dispersive X-ray spectrometer(EDX)measurement showed that the composition of the films is Mg
0.7
Zn
0.3
O.Secondly
the interdigital Au electrodes
which were defined on 50 nm Au layer by conventional UV photolithography and wet etching were coated onto the film surface.The interdi-gital fingers are 500 μm in length
5 μm in width
and the spacing between the fingers is 5 μm.The absorption spectrum of the MgZnO films shows strong absorption at 230 nm
and very weak absorption from 320 to 600 nm.Note that there is a tail in the range from 245 nm to 300 nm in the absorption spectrum
which may be attributed to the nonuniformly distribution of Mg composition or the phase separation.The photodetector shows a peak response at 225 nm with the cutoff wavelength at 230 nm
which is in accordance with the absorption spectrum.Until now
none report on the MgZnO photodetector prepared by RF magnetron sputtering with the peak spectral response short to 225 nm can be found to the best of our knowledge.We think that by optimizing the growth conditions and reducing the composition fluctuations and phase separation occurred in the films
photodetector with improved performance can be expected.