Normal-Incidence Reflectivity of Mo/Si Multilayer at 13.9 nm

FAN Xian-hong; CHEN Bo; NI Qi-liang; WANG Xiao-guang

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Normal-Incidence Reflectivity of Mo/Si Multilayer at 13.9 nm

更新时间：2020-08-12

- Normal-Incidence Reflectivity of Mo/Si Multilayer at 13.9 nm
- Chinese Journal of Luminescence Vol. 29, Issue 2, Pages: 405-408(2008)
- 作者机构：
  
  1. 中国科学院, 研究生院北京,100049
  2. 中国科学院长春光学精密机械与物理研究所, 应用光学国家重点实验室,吉林长春,130033
- 作者简介：
- 基金信息：
- DOI：
  CLC： O434
- Received：25 August 2007，
  
  Revised：24 November 2007，
  
  Published：20 March 2008
- 稿件说明：
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范鲜红, 陈波, 尼启良, 王晓光. 中心波长为13.9nm的正入射Mo/Si多层膜[J]. 发光学报, 2008,29(2): 405-408

FAN Xian-hong, CHEN Bo, NI Qi-liang, WANG Xiao-guang. Normal-Incidence Reflectivity of Mo/Si Multilayer at 13.9 nm[J]. Chinese Journal of Luminescence, 2008,29(2): 405-408
范鲜红, 陈波, 尼启良, 王晓光. 中心波长为13.9nm的正入射Mo/Si多层膜[J]. 发光学报, 2008,29(2): 405-408 DOI：

FAN Xian-hong, CHEN Bo, NI Qi-liang, WANG Xiao-guang. Normal-Incidence Reflectivity of Mo/Si Multilayer at 13.9 nm[J]. Chinese Journal of Luminescence, 2008,29(2): 405-408 DOI：

摘要

用由铜靶激光等离子体光源等组成的反射率计对自行设计的周期厚度为7.14nm的120层Mo/Si多层膜进行极紫外(EUV)波段反射率测量。由于多层膜层数增加所引起的吸收、膜层界面之间的扩散以及镀膜过程中的膜厚控制误差或表面被氧化(污染)等原因

正入射Mo/Si多层膜在13.9nm处的反射率低于理论计算值73.2%

最后用原子力显微镜(AFM)测量其表面粗糙度为σ=0.401nm。

Abstract

The results of the reflectivity measurement of a laser-produced plasma (LPP) source of extreme ultraviolet (EUV) for 13.9 nm are presented. The designed structure with 120 layers of molybdenum/silicon (Mo/Si) multilayer and a period thickness of 7.14 nm was produced by ion beam sputter deposition technique. Because of the absorption by the increase overall thickness

diffusion between layers and surface oxidation (contamination)

adjacent normal-incidence

the reflectivity of multilayer at 13.9 nm remains below the theoretical value of 73.2%. The surface roughness of multilayer measured by atom force microscope (AFM) is 0.401 nm.

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references

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