您当前的位置:
首页 >
文章列表页 >
Photoluminescence Properties in Nd, Ce-implanted Si-based Films
更新时间:2020-08-11
    • Photoluminescence Properties in Nd, Ce-implanted Si-based Films

    • Chinese Journal of Luminescence   Vol. 23, Issue 3, Pages: 291-295(2002)
    • CLC: O482.31
    • Received:18 September 2001

      Revised:22 March 2002

      Published:20 May 2002

    移动端阅览

  • YUAN Mei-ling, LIU Nan-sheng, WANG Shui-feng, ZENG Yu-xin, WANG Qing-nian. Photoluminescence Properties in Nd, Ce-implanted Si-based Films[J]. Chinese Journal of Luminescence, 2002,23(3): 291-295 DOI:

  •  
  •  

0

Views

87

下载量

2

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

Electrochromic Properties of WO3 Film by Spin-coating
Effect of Fe3O4 Nanoparticles on P3HT: PCBM Solar Cells
Improvement of The Field Effect Mobility of OTFT by Using Organic Hole Transport Material
Effects of Sputtering Pressure on Microstructure and Chemical Composition of Amorphous Hg1-xCdxTe Films
The Surface Morphology and Photoluminescence Properties of ZnO Crystals Synthesized by Flux Method

Related Author

ZHANG Guan-guang
NI Hao-zhi
ZHANG Xiao-chen
HUANG Zhi-wei
TAO Rui-qiang
YAO Ri-hui
NING Hong-long
PENG Jun-biao

Related Institution

Institute of Polymer Optoelectronic Materials and Devices, State Key Laboratory of Luminescent Materials and Devices, School of Materials Science and Engineering, South China University of Technology
State Key Laboratory on High Power Semiconductor Lasers, Changchun University of Science and Technology
School of Chemical Engineering, Changchun University of Technology
State Key Laboratory on Integrated Optoelectronics, Jilin University Region, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Kunming Institute of Physics
0