From the 1980s

our main research results on waveguid grating domain of integrated optics are introduced as follows.The first

we designed and made Lloyd's simple versatile exposure interferometer.In the same installation

it can be formed by adjusting location of column lens to the straight stripe grating of the equal period

the chirped grating or the curve-grating masks on the photoresist

respectively. And then combining with ion or chemical etching technique

the various waveguid grating devices for integrated optics can be fabricated. The set up can also be used to fabricate volume holographic phase Bragg gratings with slant stripe by adjusting (angles) between sample and mirror. This Lloyd's exposure interferometer compared with traditional double-optical path exposure interferometer has the advantages

such as small-sized

versatile

a few of optical elements

shorter optical path

vibration-proof

small angle exposure and so on. So the technique by using Lloyd's exposure to make photoresist grating masks is called "standard technique"

ane quoted abroad extensively. Up to now. grating devices have successfully been fabricated on varied waveguide materials

such as semiconductors

glasses

polymers and so on

by Lloyd's exposure and ion etching techinque. The second

some research results of the waveguide grating devices in our group since the year 1988 include: (1)The photoresist grating was made on parabolic coupling horns of channel waveguide with 4 μm width of K

+

-Na

+

ion exchange CdS

x

Se

1-x

microcrystal glass to form grating limiter of 12 μJ limited energy threshold. (2) DFB optical bistability device was made on CdS

x

Se

1-x

microcrystal glass waveguide with K

+

-Na

+

ion exchange by Lloyd's exposure and ion etching technique to obtain bistability switch time of 63 ps and threshold average powe of 77 mW. So devices operating with super fast rate and lower power loss were realized.(3)Chirped grating was made on K

+

-Na

+

ion exchange CdS

x

Se

1-x

microcrystal glass wavequide by ion etching to form optical beam scanner. Maximum change quantity of focus location moving was 80 μm in power density of 1.5×10

2

W/cm

2

by using Ar ion laser of 0.514 5 μm wavelength. (4) Poly-layer ZnS/ZnSe thin film (clading) was alternatirely coated on BK7 glass waveguide of Ag

+

-Na

+

ion exchange to form nonlinear waveguide grating device. Then optical interconnection with dynamic seek position characteristic with 3 cm linear space can be realized. (5) Interconnection coupling devices with volume holographic phase Bragg grating-light guided board were fabricated on photopolymer with red sensitive to form the grating-splitting board with equal intensity and successfully used for optical butterfly interconnection network of computer. (6)Volume (holographic) phase Bragg grating was fabricated on same glass light guided board to form optical interconnection of the spot to the spot with semiconductor laser 0.78 μm. Its potential application for optical interconnection (between) two printed was indicated. (7) Wavelength-division multiplexed device on monolithic integrated waveguide was made and measured to get complete separation of double-wavelength of 0.632 8 μm and 0.785 μm.