THE STUDY ON LASER BAND WIDTH DEPENDENT INFORMATION WRITING EFFICIENCY

Zhang Jiahua; Huang Shihua; Yu Jiaqi; Le Gouet J-L; Tian M; Lorgere I; Galaup J P; Grelet F

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THE STUDY ON LASER BAND WIDTH DEPENDENT INFORMATION WRITING EFFICIENCY

更新时间：2020-08-11

- THE STUDY ON LASER BAND WIDTH DEPENDENT INFORMATION WRITING EFFICIENCY
- Chinese Journal of Luminescence Vol. 18, Issue 4, Pages: 310-312(1997)
- 作者机构：
  
  1. Laboratoire Aime Cotton, Batiment 505, 91405 Orsay Cedex, France
  2. 中国科学院激发态物理开放研究实验室, 长春 130021
- 作者简介：
- 基金信息：
- DOI：
  CLC： O438
- Published：30 November 1997
- 稿件说明：
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张家骅, 黄世华, 虞家琪, Le Gouet J-L, Tian M, Lorgere I, Galaup J P, Grelet F. 依赖于激光线宽的信息写入效率的研究[J]. 发光学报, 1997,18(4): 310-312

Zhang Jiahua, Huang Shihua, Yu Jiaqi, Le Gouet J-L, Tian M, Lorgere I, Galaup J P, Grelet F. THE STUDY ON LASER BAND WIDTH DEPENDENT INFORMATION WRITING EFFICIENCY[J]. Chinese Journal of Luminescence, 1997,18(4): 310-312
张家骅, 黄世华, 虞家琪, Le Gouet J-L, Tian M, Lorgere I, Galaup J P, Grelet F. 依赖于激光线宽的信息写入效率的研究[J]. 发光学报, 1997,18(4): 310-312 DOI：

Zhang Jiahua, Huang Shihua, Yu Jiaqi, Le Gouet J-L, Tian M, Lorgere I, Galaup J P, Grelet F. THE STUDY ON LASER BAND WIDTH DEPENDENT INFORMATION WRITING EFFICIENCY[J]. Chinese Journal of Luminescence, 1997,18(4): 310-312 DOI：

摘要

本工作研究了在聚苯乙烯八乙基卟啉永久性光谱烧孔材料上进行光谱相位编码时域光全息读写中信息写入效率随激光谱带变宽而降低的现象

建立了分子转动引起光谱再分布模型

并计算了不同写入激光线宽下信号衍射效率随曝光量的变化规律

很好地符合了实验结果.

Abstract

In this paper

we present a model which describes the spectral redistribution process due to rotation of molecules in hole burning.Based on this model.the dependence of diffraction efficiency on exposure time under broad and narrow laser band are calculated

respectively.which are in good agreement with experimental results.

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Inhomogeneous Line Broadening, Fluorescence Line Narrowing and Persistent Spectral Hole Burning of Divalent Samarium Ions

THE STUDY OF SPECTRAL HOLE DEPTH UNDER DIFFERENT GATING LIGHT

THE DEPENDENCE OF HOLE WIDTH AND DEPTH ON BURNING LASER DURATION IN SPECTRAL HOLE BURNING

Related Author

ZHANG Jia-hua

HUANG SHI-hua

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Zhang Jiahua

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Huang Shihua

Yu Jiaqi

Related Institution

Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences

Changchun Institute of Physics, Chinese Academy of Sciences

Changchun Institute of Physics, Academia Sinica

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