TEMPERATURE DEPENDENCE OF HOMOGENEOUS LINE WIDTH IN PHOTON-GATED SPECTRAL HOLE BURNING MATERIALS
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TEMPERATURE DEPENDENCE OF HOMOGENEOUS LINE WIDTH IN PHOTON-GATED SPECTRAL HOLE BURNING MATERIALS
Chinese Journal of LuminescenceVol. 16, Issue 1, Pages: 11-15(1995)
作者机构:
中国科学院长春物理研究所激发态物理开放实验室 长春,130021
作者简介:
基金信息:
DOI:
CLC:
Published:28 February 1995,
Received:14 June 1994,
稿件说明:
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JIANG LIANHE, TIAN MINGAHEN, HUANG SHIHUA, et al. TEMPERATURE DEPENDENCE OF HOMOGENEOUS LINE WIDTH IN PHOTON-GATED SPECTRAL HOLE BURNING MATERIALS. [J]. Chinese journal of luminescence, 1995, 16(1): 11-15.
DOI:
JIANG LIANHE, TIAN MINGAHEN, HUANG SHIHUA, et al. TEMPERATURE DEPENDENCE OF HOMOGENEOUS LINE WIDTH IN PHOTON-GATED SPECTRAL HOLE BURNING MATERIALS. [J]. Chinese journal of luminescence, 1995, 16(1): 11-15.DOI:
TEMPERATURE DEPENDENCE OF HOMOGENEOUS LINE WIDTH IN PHOTON-GATED SPECTRAL HOLE BURNING MATERIALS
the authors report the temperature dependence of homogeneous line width in photon-gated spectral hole burning materials:metal-tetrabenzoporphyrin derivatives/p-hyfroxybenzaldhyde/PMMA or CA
at a temperature range
from 30K to 70K.The hole was burned by a burning light(632.8nm)and a gating light(532nm)with low power.According to relation between hole width(
Γ
hole
)and homogenous;omewodtj(
Γ
horn
)
Γ
hole
=
Γ
horn
we obtained a law that increase of homogeneous line width is linear with temperature to the power of 1.29.
关键词
有机薄膜光谱烧孔均匀线宽温度
Keywords
organic filmhole burninghomogeneous line widthtemperature