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THE INFLUENCE OF OXYGEN PARTIAL PRESSURE ON THE PROPERTY OF SiO2 THIN FILMS
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    • THE INFLUENCE OF OXYGEN PARTIAL PRESSURE ON THE PROPERTY OF SiO2 THIN FILMS

    • Chinese Journal of Luminescence   Vol. 16, Issue 3, Pages: 249-255(1995)

    • Received：10 June 1994，

      Revised：1995-1-16，

      Published：30 August 1995

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  • Chen Lichun, Wang Xiangjun, Xu Xurong, Yao Jianquan. THE INFLUENCE OF OXYGEN PARTIAL PRESSURE ON THE PROPERTY OF SiO<sub>2</sub> THIN FILMS[J]. Chinese Journal of Luminescence, 1995,16(3): 249-255 DOI：

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