MO-CVD is a chemical vapor deposition method using organometallic compounds as starting materials. It has showed the unique advantages for the preparation of materials at high purity and thin layer and has been extensively used. There fore

much attention has been paid to the MO-CVD method recently.In this paper

the principle

features and applications of organometallic compounds chemical vapor deposition(MO-CVD)have been reviewed and the preparation of II-VI compounds by MO-CVD method has been specially disscused.